恒侨实业有限公司
成立于1988年
 
旭化成AsahiKASEI
 
SUNFORT Dry Film Photoresist YQ-40PT features include:
Wider latitude of exposing and developing conditions.

High resolution and excellent reproducibility of photomask after developing.

Excellent imaging contrast

Unexposed colour: Green
Exposed colour: Dark Blue

Polymerized resist is tough and has a good etching resistance to etchants such as:

Ferrie Chloride (FeCl3)
Cupric Chloride (CuCl2)
Ammonium Persulfate (NH4S2O8)

Polymerized resist remains firmly bonded to copper surface, and has an excellent chemical resistance to acidic electroplating baths such as:

Copper Sulfate
Solder Fluoborate

Acidic Cleaners, ammonium perdulfate and dilute sulfaric acid can be used in preplate cleaning.

During stripping, polymerized resist breaks up into small articles and is not soluble in a stripping solution

SUNFORT is a polyacrylic-based dry film photoresist for printed circuit board production, ultilizing alkaline-solution development. SUNFORT grades and types are developed and designed to meet the broad-ranging, advanced requirements for production of higher performance, higher value-added printed circuit boards.
 
流程
条件
贴膜
板面温度
50oC
贴膜温度
105oC
贴膜压力
3.5 kg / cm2
贴膜速度
1.5 m / 分钟
静置
 
30 分钟
曝光
 
40-120 mj / cm2
静置
 
30 分钟
显影
显影液
1.0wt%Na2Co3
显影温度
30oC
喷嘴压力
1.5kg/cm2
显影时间
55秒(B.P. = 35秒)
退膜
退膜溶液
3.0wt%NaoH
退膜温度
50oC
喷嘴压力
2.0kg/cm2
退膜温度
55秒(L.P.=35秒)
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